Influence of HiPIMS pulse widths on the deposition behaviour and properties of CuAgZr compositionally graded films

In this work, the influence of different pulse widths (25, 50 and 100 μs) during high power impulse magnetron sputtering (HiPIMS) copper, silver zirconium was investigated in terms plasma properties combinatorial composition gradient CuAgZr film libraries. situ diagnostics via optical emission spectroscopy (OES), time-of-flight mass spectrometry (TOFMS), modified quartz crystal microbalance (m-QCM), followed by ex X-ray diffraction (XRD) scanning electron microscopy (SEM) investigations allowed to determine effect deposition parameters on thin films' microstructural changes. Changing width, while keeping duty cycle constant, discharge target region ionised fraction sputtered species substrate region. The maximum Cu (19 %) found for μs, resulting compact smooth morphology Cu-rich films, whereas short 25 μs pulses provided porous columnar films with rough surfaces, as result from Ar + bombardment. For Ag-rich Ag segregation dense layers, regardless used width. Furthermore, low (<10 at.%) produced HiPIMS direct-current (DCMS) were compared structural mechanical property changes a function Zr contents. studied chemical range, linear relationship between content, XRD phase shift observed contrast DCMS's more abrupt transitions. An increase hardness elastic modulus (up 44 % 22 %, respectively) DCMS ones. obtained results highlight HiPIMS's flexibility providing wide range tailoring possibilities meet specific application requirements, such crystalline microstructure, density associated properties. • Three utilised produce identified each target. microstructures coatings linked conditions. DCMS- HiPIMS-fabricated compared. Improved are pointed.